偏压对磁控溅射Cr-N薄膜组织及性能影响

偏压对磁控溅射Cr-N薄膜组织及性能影响

PDF(1192 KB)

Journal of Wuhan University of Technology ›› 2010, Vol. 32 ›› Issue (18) : 1-3.

材料科学与工程

{{article.zuoZhe_EN}}

Author information +

History +

HeighLight

{{article.keyPoints_en}}

Abstract

{{article.zhaiyao_en}}

Key words

Cite this article

Download Citations

References

Publishing order | Descend order by publishing year | Descend order by cited within

References

{{article.reference}}

Funding

RIGHTS & PERMISSIONS

{{article.copyrightStatement_en}}

{{article.copyrightLicense_en}}

PDF(1192 KB)

Accesses

Citation

Detail

Sections

Recommended

/

〈

〉