采用磁控溅射技术制备出Ba_(2-x)TiSi_(2+y)O_8薄膜,研究了溅射工作气压对薄膜结构的影响。实验发现,随气压降低,Ba含量增加、Si含量下降,薄膜趋向于Ba_(2-x)TiSi_(2+y)O_8结构。此外,降低工作气压还有助于提高薄膜的结晶度及取向度;这一现象与溅射过程中溅射粒子平均自由程的变化密切相关工作气压降低,使Ba离子平均自由程提高,到达衬底表面Ba原子数量增加、能量上升,抑制了Ba缺失现象,提高了薄膜质量。

Effect of Sputtering Pressure on Microstructure of Ferroelectric Ba_2Si_2TiO_8 Thin FilmsLIU Li-ying1,ZHU Man-kang1,HOU Yu-dong1,SHAO Ming-ming2,YAN Hui1 (1.Key Lab of Advanced Functional Materials, Beijing University of Technology, Beijing 100022, China; 2.Beijing Changfeng SAW Corp, Beijing 100085, China)Fresnoite thin films were fabricated by r.f. sputter. It indicated that the working pressure impacted strongly on the compositions and structures of the thin films.As the pressure decreased, the deficiency of Ba and the excess of Si in the thin films were controlled. Besides, the decrease of the pressure improved the crystallinity and orientation degree of the thin films. These were attributed to the increase of the mean free path and impacting energy of ions at low working pressure.fresnoite; thin film; magnetron sputter; working pressure